Specific Process Knowledge/Lithography/Descum: Difference between revisions
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===Plasma asher 2 === | ===Plasma asher 2 === | ||
Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | |||
Flow of O2 was 100 | |||
{| {{table}} | {| {{table}} | ||
| align="center" | | | align="center" | | ||