Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 118: | Line 118: | ||
| 5 | | 5 | ||
| ~1 µm (not optimized) | | ~1 µm (not optimized) | ||
| Dev: SP60s <br> Probably under-exposed | | PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
| Quality | | Quality | ||
| Line 124: | Line 124: | ||
| 0 | | 0 | ||
| 1 µm | | 1 µm | ||
| Dev: SP60s <br> Probably under-exposed | | PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed | ||
|- | |- | ||