Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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=== InP etch with Cl2/H2 and a Si carrier wafer [[Image:section under construction.jpg|70px]] === | === InP etch with Cl2/H2 and a Si carrier wafer [[Image:section under construction.jpg|70px]] === | ||
''Work done by Berit Herstrøm @Nanolab spring 2019'' | |||
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|'''Recipe name''' | |'''Recipe name''' | ||
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*Comparing of this Cl2/H2 recipe with HBr recipe on e-beamed structures (By Aurimas @photonic) | |||
=== InP etch with Cl2/CH4/Ar 2013=== | === InP etch with Cl2/CH4/Ar 2013=== | ||