Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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<gallery> | |||
Image:s12 800W 6min profile angle.JPG | |||
Image:s12 800W 6 min T20dg01.jpg | |||
Image:s12 800W 6min profile06.jpg | |||
</gallery> | |||
=== InP etch with Cl2/CH4/Ar 2013=== | === InP etch with Cl2/CH4/Ar 2013=== | ||