Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
| Line 74: | Line 74: | ||
|- | |- | ||
|Cl2 flow | |Cl2 flow | ||
| sccm | |6.6 sccm | ||
|- | |- | ||
|H<sub>2</sub> flow | |H<sub>2</sub> flow | ||
| sccm | |5.4 sccm | ||
|- | |- | ||
| | |Process time | ||
| | |6 min | ||
|- | |- | ||
|Platen power | |Platen power | ||
| | |150 W | ||
|- | |- | ||
|Coil power | |Coil power | ||