Specific Process Knowledge/Pattern Design: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Pattern_Design click here]''' | ||
= Pattern Design and Mask Fabrication = | = Pattern Design and Mask Fabrication = | ||
'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pattern_Design_and_Mask_Fabrication click here]''' | ||
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== Pattern Design == | == Pattern Design == | ||
For making a pattern on a substrate it is necessary to use a software tool to design the pattern layout. This counts for all kind of lithography and laser cutting. There are a number of | For making a pattern on a substrate it is necessary to use a software tool to design the pattern layout. This counts for all kind of lithography and laser cutting. There are a number of different software tools that can be used, some of the more commonly used are: | ||
* CleWin | * CleWin | ||
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=== Layout file format=== | === Layout file format=== | ||
* For '''E-beam lithography''' you need to prepare a set of files (GDS, V30, sdf, jdf and mgn files). For details about how to prepare the files for E-beam lithography, please see [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation#FilePreparation|File preparation]]. For details about how to make | * For '''E-beam lithography''' you need to prepare a set of files (GDS, V30, sdf, jdf and mgn files). For details about how to prepare the files for E-beam lithography, please see [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation#FilePreparation|File preparation]]. For details about how to make aligned E-beam patterns, please have at look at [[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#Design_of_global_marks_and_chip_marks|Design of global marks and chip marks]] | ||
* For '''laser cutting''' the layout file has to be saved as a DXF file that is uploaded to the equipment computer. | * For '''laser cutting''' the layout file has to be saved as a DXF file that is uploaded to the equipment computer. | ||
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*[[mask_spec| Templates for 5" and 7" masks]] | *[[mask_spec| Templates for 5" and 7" masks]] | ||
== Mask sets made by | == Mask sets made by Nanolab == | ||
=== Danchip quality control masks === | === Danchip quality control masks === | ||