Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes: Difference between revisions
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==Dry oxidation recipe steps== | ==Dry oxidation recipe steps== | ||
'''00 STANDBY''' | |||
''Message: "Standby"'' | |||
When the furnace is not in use, and when a recipe is selected, this will be the active step. | |||
If a recipe is aborted, it will jump to the STANDBY step. | |||
The furnace is kept closed and clean: | |||
* Standby temperature: 700 C | |||
N2 flow: 3 SLM | * N2 flow: 3 SLM | ||
* O2 flow: 0 SLM | |||
The user has to press "Start" (on the touch screen or furnace computer) to start the recipe. | The user has to press "Start" (on the touch screen or furnace computer) to start the recipe. | ||
'''01 LM-LOCK''' | |||
Message: "Standby" | |||
''Message: "Standby"'' | |||
The recipe can only continue, if a user is logged on in LabManager | The recipe can only continue, if a user is logged on in LabManager | ||
Message: "Boat moving" | '''02 OPEN''' | ||
''Message: "Boat moving"'' | |||
The furnace opens | The furnace opens | ||
The user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace | '''03 LOAD WAFERS''' | ||
''Message: "Load wafers'' | |||
When the furnace is open, the user can load wafers in the furnace. | |||
The user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | |||
'''04 CLOSE''' | |||
''Message: "Boat moving"'' | |||
The furnace is closing | The furnace is closing | ||
Message: "Heat-up" | '''05 HEAT UP''' | ||
''Message: "Heat-up"'' | |||
The furnace is heating up to the temperature defined in the recipe | The furnace is heating up to the temperature defined in the recipe | ||
The recipe will continue to the next step, when the temperature of center heating zone (zone 2) reached the right temperature | The recipe will continue to the next step, when the temperature of center heating zone (zone 2) reached the right temperature | ||
Message: "Dry oxidation" | '''06 OXIDATION''' | ||
''Message: "Dry oxidation"'' | |||
The dry oxidation is started | The dry oxidation is started | ||
O<sub>2</sub> flow: 5 SLM | |||
N<sub>2</sub> flow: 0 SLM | |||
The oxidation time is a variable command. | The oxidation time is a variable command. | ||
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has been defined by the user. The oxidation time can be changed, until the oxidation step is started. | has been defined by the user. The oxidation time can be changed, until the oxidation step is started. | ||
'''07 ANNEAL''' | |||
''Message: "Anneals/Dens"'' | |||
Message: "Unload wafers" | '''08 COOL DOWN''' | ||
''Message: "Cool-down"'' | |||
The furnace is cooling down to 700 <sup>o</sup>C (the standby temperature) | |||
'''09 UNLOAD WAFERS''' | |||
''Message: "Unload wafers"'' | |||
The user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace | The user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace | ||
Message: "Open" | '''10 OPEN''' | ||
''Message: "Open"'' | |||
The furnace opens. | The furnace opens. | ||
Message: "Unload wafers" | '''11 UNLOAD''' | ||
''Message: "Unload wafers"'' | |||
When the furnace is open, the wafer can be unloaded. | When the furnace is open, the wafer can be unloaded. | ||