Specific Process Knowledge/Etch/HF Vapour Phase Etch: Difference between revisions
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The Raith Elphy system is a pattern generator built onto the [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Leo|LEO Scanning Electron Microscope ]] (SEM) in cleanroom F-2. All users must therefore acquire license to use the SEM LEO before acquiring license to the Raith Elphy system. | The Raith Elphy system is a pattern generator built onto the [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Leo|LEO Scanning Electron Microscope ]] (SEM) in cleanroom F-2. All users must therefore acquire license to use the SEM LEO before acquiring license to the Raith Elphy system. | ||
Remember that you need '''''two additional trainings''''' from | Remember that you need '''''two additional trainings''''' from Nanolab staff in order to be able to use this tool for lithography. Please refer to the [[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|General Page]] for further information. | ||
The Raith ELPHY Quantum software (from now on, Elphy) is installed on the Raith pc located right next to the LEO SEM pc. The workstation is more or less independent from the LEO itself. If you try to access Elphy without properly setting up the microscope first, it will usually return a communication error, but it would still be partially functional e.g. to prepare layouts and position lists. When you want to do actual patterning, you will need to operate on both computers at the same time. | The Raith ELPHY Quantum software (from now on, Elphy) is installed on the Raith pc located right next to the LEO SEM pc. The workstation is more or less independent from the LEO itself. If you try to access Elphy without properly setting up the microscope first, it will usually return a communication error, but it would still be partially functional e.g. to prepare layouts and position lists. When you want to do actual patterning, you will need to operate on both computers at the same time. | ||