Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
| Line 27: | Line 27: | ||
![[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP metal]] | ![[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP metal]] | ||
![[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | ![[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | ||
![[Specific Process Knowledge/Etch/HF Vapour Phase Etch|HF Vapour Phase Etch]] | |||
|- | |- | ||
| Line 47: | Line 48: | ||
| | | | ||
*Primarily for pure physical etch by sputtering with Ar-ions | *Primarily for pure physical etch by sputtering with Ar-ions | ||
| | |||
*This is a fact about HF VPE | |||
|- | |- | ||
| Line 91: | Line 94: | ||
| | | | ||
*Any material that is accepted in the machine | *Any material that is accepted in the machine | ||
| | |||
*HF VPE mask material 1 | |||
*HF VPE mask material 2 | |||
*HF VPE mask material 3 | |||
|- | |- | ||
| Line 116: | Line 123: | ||
*Process dependent | *Process dependent | ||
*Tested once ~22nm/min | *Tested once ~22nm/min | ||
|- | | | ||
*Sample and load dependent | |||
*Expected range: 12 - 175 nm/min | |||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
| Line 146: | Line 154: | ||
*<nowiki>#</nowiki>1 150 mm wafers with special carrier | *<nowiki>#</nowiki>1 150 mm wafers with special carrier | ||
*<nowiki>#</nowiki>1 200 mm wafer | *<nowiki>#</nowiki>1 200 mm wafer | ||
| | |||
*Pieces | |||
*<nowiki>#</nowiki>1 50 mm wafer | |||
*<nowiki>#</nowiki>1 100 mm wafer | |||
*<nowiki>#</nowiki>1 150 mm wafer | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Line 220: | Line 233: | ||
*Polymers | *Polymers | ||
*Capton tape | *Capton tape | ||
| | |||
*[http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=458 Please take a look in the cross contamination sheet in LabManager for details] | |||
*Silicon | |||
*Silicon oxides | |||
*Aluminium | |||
|- | |- | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||