Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

Revision as of 15:52, 15 January 2009 view source Yg (talk \| contribs) danchip 159 edits →Aluminium deposition on AZ5214 for lift-off ← Older edit		Revision as of 15:54, 15 January 2009 view source Yg (talk \| contribs) danchip 159 edits →Aluminium deposition on AZ5214 for lift-off Newer edit →
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	It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath.		It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath.
	This ~~proces~~ was done by steps evaporating only 5000Å a time with 5min pause and pressure down to at least 2E-6.		This process was done by steps evaporating only 5000Å a time with 5min pause and pressure down to at least 2E-6.