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Specific Process Knowledge/Pattern Design: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
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===Alignment marks===
===Alignment marks===
The following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching.
The following alignment marks are suggested to use on the Mask aligners for good pattern recognition. Pleased be adviced that they can be removed in KOH etching.
*[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file''
*[[Media:Alignmentkeys1.cif|Alignment marks 1 .cif]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file''
*[[Media:Alignmentkeys2.tdb|Alignment marks 2 .tdb]] - ''You need the program "L-Edit" to open this file''
*[[Media:Alignmentkeys1.tdb|Alignment marks 1 .tdb]] - ''You need the program "L-Edit" to open this file''


====Alignment marks location====
====Alignment marks location====
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