Specific Process Knowledge/Lithography/Descum: Difference between revisions
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Revision as of 11:02, 30 August 2019
Descum results
Plasma asher 1
| colspan="6"| ashing time (min) | |||||||||
|---|---|---|---|---|---|---|---|---|---|
| 1 | 2 | 5 | 7 | 10 | 10 | ||||
| Recipe | O2 flow | N2 flow | Power | Etched Thickness (nm) | |||||
| 1 | 70 | 70 | 150 | 14,2 | 16,3 | 47,6 | 123,2 | 854,3 | 862,1 |
| 2 | 500 | 0 | 200 | 8,1 | 32,9 | 271,1 | 495,6 | 446,2 | |