Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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==Aluminium deposition on AZ5214 for lift-off== | ==Aluminium deposition on AZ5214 for lift-off== | ||
Negative photolithographi process is recomende. | Negative photolithographi process is recomende. | ||
Positive photolithographi process from 1,5µ is possible especially for thin layers of metal. | Positive photolithographi process from 1,5µ is possible especially for thin layers of metal. | ||
The more patern the easyer lift. | The more patern the easyer lift. | ||
It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath. | It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath. | ||
This proces was done by steps evaporating only 5000Å a time with 5min pause and pressure down to at least 2E-6. | This proces was done by steps evaporating only 5000Å a time with 5min pause and pressure down to at least 2E-6. | ||