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Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF: Difference between revisions

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<gallery caption="XPS results." widths="500px" heights="500px" perrow="2">
<gallery caption="XPS results." widths="500px" heights="500px" perrow="2">
image:Al_surface_survey_20190501.png| Survey scan of Al thin film with native oxide. No Ar<sup>+</sup> sputtering applied. Substrate: Silicon 4" wafer with native oxide.
image:Al2O3_HF_20190826.png| Survey scan of Al thin film with native oxide. No Ar<sup>+</sup> sputtering applied. Substrate: Silicon 4" wafer with native oxide.
</gallery>
</gallery>


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