Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
This page is | ==This page has not been made yet - the information is not correct!!== | ||
==LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon== | ==LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon== | ||
[[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|A4 Furnace PolySilicon: positioned in cleanroom 2]] | [[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|A4 Furnace PolySilicon: positioned in cleanroom 2]] | ||