Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF: Difference between revisions
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[[image:AL203_Hf_etch.jpg|500x500px|left|thumb|]] | [[image:AL203_Hf_etch.jpg|500x500px|left|thumb|]] | ||
The etch rates: | |||
*'''5% HF: 1.74 nm/s''' | |||
*'''1vol. H<sub>2</sub>O : 1vol. 5% HF 1.05 nm/s''' | |||
*'''2vol. H<sub>2</sub>O : 1vol. 5% HF 0.723 nm/s''' | |||