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Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Wet_oxidation_C1_furnace click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Wet_oxidation_C1_furnace click here]'''


The Anneal Oxide furnace (C1) is the used for annealing, wet and dry oxidation of 4" and 6" wafers.
The Anneal Oxide furnace (C1) is the used for annealing, wet and dry oxidation of 4" and 6" wafers.
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==Test of the wet oxidation by steamer==   
==Test of the wet oxidation by steamer==   
''by Patama Pholprasit @danchip in October 2014''
''by Patama Pholprasit @nanolab in October 2014''
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