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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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| 3          <!--Platen power  -->
| 3          <!--Platen power  -->
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|'''Click HERE!''' ]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|'''Click HERE!''' ]]      <!-- link processes -->
| NA           <!--Keywords  -->
| Note: Lior Shiv got very high etch rate for this recipe >1.5µm/min 2019-07-12           <!--Keywords  -->
|-
|-
|-
|-
! no name, tested by Lior Shiv@Capres 2019-017-12    <!--Recipe Name  -->
! no name, tested by Lior Shiv@Capres 2019-17-12    <!--Recipe Name  -->
| A          <!--Step  -->
| A          <!--Step  -->
| 20            <!--Temperature  -->
| 20            <!--Temperature  -->
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