Jump to content

Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions

← Older editNewer edit →
VisualWikitext
Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Line 16: Line 16:


    
    




Line 29: Line 26:
The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.  
The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.  


The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.   
It works only for 4" wafers because a special holder is need.   
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in 346-904]]
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in 346-904]]


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Four-Point_Probe"