Specific Process Knowledge/Lithography/4562: Difference between revisions
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==Spin coating== | ==Spin coating== | ||
[[Image: | [[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)]] | ||
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Revision as of 10:16, 24 July 2019
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AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).
Priming
Spin coating
Exposure
Development
The recommended development speed for AZ 4562 is 2µm/min. A