Specific Process Knowledge/Lithography/nLOF: Difference between revisions
Created page with "'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Kno..." |
No edit summary |
||
| Line 2: | Line 2: | ||
AZ nLOF 2020 is a negative UV photoresist, suitable for loft-off processes. | AZ nLOF 2020 is a negative UV photoresist, suitable for loft-off processes. | ||
==Spin coating== | |||
[[Image:nLOFspincurves.JPG|500x500px|thumb|Spin curves for AZ nLOF 2020 using a 30s spin-off, and a 60s@110°C softbake]] | |||
==Post-exposure bake== | ==Post-exposure bake== | ||