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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''AZ 5214E'''
|'''[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]]'''
|Positive but the image can be reversed
|Positive but the image can be reversed
|310 - 420 nm
|310 - 420 nm
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''AZ 4562'''
|'''[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]]'''
|Positive
|Positive
|310 - 440 nm
|310 - 440 nm
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''AZ MiR 701'''
|'''[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]]'''
|Positive
|Positive
|310 - 445 nm
|310 - 445 nm
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