Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/SIMS settings: Difference between revisions

Revision as of 14:46, 18 August 2021

Feedback to this page: click here

Made by bghe@nanolab in 2015

	Lower plate	Upper plate
SIMS setting for different materials
Ti	-1
Si	-1	(2)
Al	-1	1
Cr	-1
Ni	-6

Revision as of 07:28, 26 June 2019 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,315 edits No edit summary ← Older edit		Revision as of 14:46, 18 August 2021 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,315 edits No edit summary Newer edit →
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/SIMS_settings click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/SIMS_settings click here]'''

	''Made by bghe@nanolab in 2015''		''Made by bghe@nanolab in 2015''