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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 714: Line 714:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|Align-flip180-align, 3 points
|rowspan="2" align="center"|Align-flip180-align, 3 points <br/> 375nm
|'''X'''
|'''X'''
| -0.625±0.125
| -0.625±0.125
Line 723: Line 723:
|'''Y'''
|'''Y'''
| -0.75±0.125
| -0.75±0.125
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|Align-flip180-align, 3 points <br/> 405nm
|'''X'''
| -0.625±0.125
|rowspan="2" align="center"|0.5µm verniers, May 2019
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -0.375±0.125


|-
|-
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