LabAdviser/Technology Research/Microfabrication of X-ray optical elements: Difference between revisions
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==Project description== | ==Project description== | ||
DTU Nanolab has been very active in development of microfabrication technology for a wide range of applications. Microfabrication technology for X-ray optical elements is rather challenging, but the potential in terms of applications is rapidly increasing. The present project aims at | DTU Nanolab has been very active in development of microfabrication technology for a wide range of applications. Microfabrication technology for X-ray optical elements is rather challenging, but the potential in terms of applications is rapidly increasing. The present project aims at improving the microfabrication technology for X-ray optical elements as well as specifically realizing X-ray gratings for dark field X-ray imaging. The project was carried out at DTU Nanolab, with a close collaboration with DTU Physics and DMRI Teknologisk Institut. | ||
Deep reactive ion etching (DRIE) of silicon has already proven to be a useful approach for fabrication of high performance refractive optical elements for shaping and focussing X-ray beams, as clearly demonstrated in a very successful previous PhD project (Frederik Stöhr) where DTU Physics, DTU Danchip and DTU Nanotech collaborated to produce excellent results. In this project we shall further improve the fabrication technology to enhance the aspect ratio of the etched structures and improve the side-wall morphology to enhance the performance of the optical elements. | Deep reactive ion etching (DRIE) of silicon has already proven to be a useful approach for fabrication of high performance refractive optical elements for shaping and focussing X-ray beams, as clearly demonstrated in a very successful previous PhD project (Frederik Stöhr) where DTU Physics, DTU Danchip and DTU Nanotech collaborated to produce excellent results. In this project we shall further improve the fabrication technology to enhance the aspect ratio of the etched structures and improve the side-wall morphology to enhance the performance of the optical elements. | ||
The etched silicon structures may also be used as moulds for replication in other materials, and in this project technology for replication in materials with high X-ray absorption will be developed and used to produce high-contrast X-ray gratings, which will benefit from high aspect ratio structuring of silicon. | The etched silicon structures may also be used as moulds for replication in other materials, and in this project technology for replication in materials with high X-ray absorption will be developed and used to produce high-contrast X-ray gratings, which will benefit from high aspect ratio structuring of silicon. | ||