Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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!Width of smallest resolved line [nm] | !Width of smallest resolved line [nm] | ||
!Alignment error (TSA) [nm] | !Alignment error (TSA) [nm] | ||
!Exposure speed [ | !Exposure speed [mm<sup>2</sup>/min] | ||
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