Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

@@ Line 241: / Line 241: @@
 *SAT results?
+'''Exposed on mask blank with AZ1500 (possibly S1800) and transferred via wet chrome etch'''
+{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;"
+|-
+|-
+|-style="background:silver; color:black"
+!colspan="2"|SAT Feb 2019
+!Width of smallest resolved line [nm]
+!Alignment error (TSA) [nm]
+!Exposure speed [mm2/min]
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|rowspan="2"|405 nm
+|'''X'''
+| kjhf
+| 100
+|rowspan="2" align="mid"| 0.000
+|-
+|-style="background:WhiteSmoke; color:black"
+|'''Y'''
+| 101
+| 0.2±0.05
+|}
 =Features=