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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 138: Line 138:
!rowspan="2"|AZ 5206E
!rowspan="2"|AZ 5206E
|rowspan="2"|1.5 µm
|rowspan="2"|1.5 µm
|375nm
| 375nm
|60 mJ/cm<sup>2</sup>
| 60 mJ/cm<sup>2</sup>
|-6
| -6
|Positive process
| comment
|comment
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|2.2 µm
| 405nm
|90 mJ/cm<sup>2</sup>
| 60 mJ/cm<sup>2</sup>
|Single puddle, 60 s
| -6
| comment
|-
|-


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