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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm)
Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm)


'''Data is for Si and optical autofocus unless otherwise stated'''
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Thickness
!Laser
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!rowspan="2"|AZ 5206E
|rowspan="2"|1.5 µm
|375nm
|60 mJ/cm<sup>2</sup>
|-6
|Positive process
|comment
|-style="background:WhiteSmoke; color:black"
|2.2 µm
|90 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|-
|-
|-style="background:LightGrey; color:black"
!rowspan="2"|AZ 5214E
|1.5 µm
|22? mJ/cm<sup>2</sup>
|Single puddle, 60 s
|rowspan="2"|Image reversal process.
Reversal bake: 120s at 110°C.<br>Flood exposure after reversal bake: 195 mJ/cm<sup>2</sup>
|-style="background:LightGrey; color:black"
|2.2 µm
|25 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 4562
|10 µm
|520-?? mJ/cm<sup>2</sup>
|Multiple puddle, 4 x 60 s
|Multiple exposure with 10 s pauses is recommended.
Process not yet established.
|-
|-
|-style="background:LightGrey; color:black"
!rowspan="3"|AZ MiR 701
|1.5 µm
|169 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|rowspan="2"|PEB: 60 s at 110°C
|-style="background:LightGrey; color:black"
|2 µm
|~200 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|-style="background:LightGrey; color:black"
|4 µm
|~280 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|rowspan="1"|PEB: 60 s at 110°C
Process adopted from process logs.
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ nLOF 2020
|1.5 µm
|104 mJ/cm<sup>2</sup>
|Single puddle, 30 s
|PEB: 60 s at 110°C
Use 60 s development for lift-off
|-
|}
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==Writing speed==
==Writing speed==