Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Large defocus range== | ==Large defocus range== | ||
The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25. The large defocus range feature is set in the resist template, and can only be accessed by choosing the 'Large Defoc Range? | The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25. The large defocus range feature is set in the resist template, and can only be accessed by choosing the 'NLAB Large Defoc Range' (?) resist template during the job setup. Dose and defoc must be set manually, as this is an otherwise empty resist template. Also, this feature will work in the entire range for pneumatic focus, but it will likely fail at the extremes for optical focus. | ||
Technically, it is possible to combine this feature with other features, such as high aspect ratio mode, but this requires that at custom resist template is set up by staff. | Technically, it is possible to combine this feature with other features, such as high aspect ratio mode, but this requires that at custom resist template is set up by staff. | ||