Specific Process Knowledge/Etch/DRIE-Pegasus/Etch silicon nanostructures: Difference between revisions

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	Extra caution is required for modification of recipe parameters, it is recommended to monitor the picoscope signals during the process, the process should be aborted if a high reflective power is observed either from coil or platen generators, thus hardware damage can be avoied. For more details, please contact Henri Jansen (henrija@dtu.dk) or Bingdong Chang (bincha@dtu.dk)		Extra caution is required for modification of recipe parameters, it is recommended to monitor the picoscope signals during the process, the process should be aborted manually if a high reflective power is observed either from coil or platen generators, thus hardware damage can be avoied. For more details, please contact Henri Jansen (henrija@dtu.dk) or Bingdong Chang (bincha@dtu.dk)