Specific Process Knowledge/Etch/DRIE-Pegasus/Etch silicon nanostructures: Difference between revisions
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| [[Image:DREM2pic4.jpg |frame|x300px|Pillars etched with 100 cycles, patterns defined with EBL and ZEP resist, smallest dimesion of 100nm (tilted view)]] | | [[Image:DREM2pic4.jpg |frame|x300px|Pillars etched with 100 cycles, patterns defined with EBL and ZEP resist, smallest dimesion of 100nm (tilted view)]] | ||
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Extra caution is required for modification of recipe parameters, it is recommended to monitor the picoscope signals during the process, the process should be aborted if a high reflective power is observed either from coil or platen generators, thus hardware damage can be avoied. For more details, please contact Henri Jansen (henrija@dtu.dk) or Bingdong Chang (bincha@dtu.dk) | |||