Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

Revision as of 20:54, 14 April 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,526 edits →Alignment ← Older edit		Revision as of 21:58, 14 April 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,526 edits →Exposure dose Newer edit →
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	==Exposure dose==		==Exposure dose==

	[[Image:AZ spectral sensitivity.gif\|~~400x400px~~\|thumb\|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/en/worth-knowing/]]		[[Image:AZ spectral sensitivity.gif\|500x500px\|thumb\|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/en/worth-knowing/]]