Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 166: | Line 166: | ||
*Rotation: 0.5±0.2° | *Rotation: 0.5±0.2° | ||
*Centring: | *Centring: | ||
**X 100±250µm | ** '''X''' 100±250µm | ||
**Y 200±250µm | ** '''Y''' 200±250µm | ||
The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | ||