Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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'''Result of using "Expose with substrate angle" on three samples with optical autofocus:''' | '''Result of using "Expose with substrate angle" on three samples with optical autofocus:''' | ||
*Rotation: 0.5±0.2° | *Rotation: 0.5±0.2° | ||
* | *Centring: | ||
**X 100±250µm | **X 100±250µm | ||
**Y 200±250µm | **Y 200±250µm | ||