Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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At the end of substrate detection, the sample is scanned twice along the bottom edge (flat), in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat/edge of the substrate. | At the end of substrate detection, the sample is scanned twice along the bottom edge (flat), in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat/edge of the substrate. | ||
* | '''Result of using "Expose with substrate angle" on three samples with optical autofocus:''' | ||
*Rotation: 0.5±0.2° | |||
*Centering: | |||
**X 100±200µm | |||
**Y 200±200µm | |||
The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | |||
'''Result of loading the same substrate 2x9 times without removing it from the stage:''' | '''Result of loading the same substrate 2x9 times without removing it from the stage:''' | ||