Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 157: | Line 157: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
! | ! | ||
! Average | ! Average | ||
! Range | ! Range | ||
|- | |- | ||
| Line 165: | Line 165: | ||
|Optical | |Optical | ||
autofocus | autofocus | ||
| 3.7 | | 3.7 mRad | ||
| ±13.9 | | ±13.9 mRad | ||
±0.8° | |||
|- | |- | ||
| Line 172: | Line 173: | ||
|Pneumatic | |Pneumatic | ||
autofocus | autofocus | ||
| -3.7 | | -3.7 mRad | ||
| ±1.4 | | ±1.4 mRad | ||
±0.08° | |||
|} | |} | ||