Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace: Difference between revisions

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 !style="background:silver; color:black;" align="center"|Purpose
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 *Phosphorus pre-deposition using POCL<sub>3</sub>
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 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
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 |style="background:LightGrey; color:black"|Process pressure
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-*1 atm
+*1 atm (atmospheric pressure)
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 |style="background:LightGrey; color:black"|Gasses on the system
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-*POCl<sub>3</sub>, N<sub>2</sub>
+*POCl<sub>3</sub>
+*N<sub>2</sub>
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 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
 |style="background:LightGrey; color:black"|Batch size
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-*1-30 100 mm wafers (or 50 mm wafers) per run
+*1-30 100 mm wafers
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 | style="background:LightGrey; color:black"|Substrate materials allowed