Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions
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The system will remove small surface roughness, so it will not count as particle contaminations. | The system will remove small surface roughness, so it will not count as particle contaminations. | ||
The system is mainly being used for quality control of the PECVDs and LPCVD nitride furnaces in the cleanroom. | The system is mainly being used for quality control of the PECVDs and LPCVD nitride furnaces in the cleanroom. | ||
Users will have to contact the responsible persons (the Thin Film group), if they want to make some particle measurements. | |||
'''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=318 Surfscan 6420]''' | '''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=318 Surfscan 6420]''' | ||