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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 474: Line 474:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!colspan="2" align="center"|
!colspan="2" align="center"|
!Shift (median) [µm]
!Offset [µm]
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|Align-flip180-align
|rowspan="2" align="center"|Align-flip180-align, 1 point
|'''X'''
|'''X'''
| 0.0±0.5
| 0.25±0.25


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| 0.0±0.5
| 0.250±0.25


|-
|-
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