Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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-16000 | -46000 | um | 2000 | um | TARAN DTU Nanolab 20190320 | -16000 | -46000 | um | 2000 | um | TARAN DTU Nanolab 20190320 | ||
This produces a 2mm high, approximately 32mm long wafer ID at the flat of a 4" wafer. | This produces a 2mm high, approximately 32mm long wafer ID at the flat of a 4" wafer. Some special characters are not allowed (e.g. ';'). | ||
Some special characters are not allowed (e.g. ';'). | |||
<br clear="all" /> | <br clear="all" /> | ||