Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Writing speed== | ==Writing speed== | ||
According to specs, the writing speed of Aligner: Maskless 02 is 285mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed in half, to approximately 140mm<sup>2</sup>/min. The writing speed for a 100x100mm<sup>2</sup> area measured during installation of the machine (acceptance test) was ~340mm<sup>2</sup>/min for both exposure wavelengths. | According to specs, the writing speed of Aligner: Maskless 02 is 285mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed in half, to approximately 140mm<sup>2</sup>/min. The writing speed for a 100x100mm<sup>2</sup> area measured during installation of the machine (acceptance test) was ~340mm<sup>2</sup>/min for both exposure wavelengths. | ||
[[Image:MLA150_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 (Fast mode) as a function of the exposure area]] | |||
*Speed vs. area (375nm) | *Speed vs. area (375nm) | ||
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[[Image:MLA150 speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 as a function of the exposure dose]] | |||
*Speed vs. dose (375nm + 405nm) | *Speed vs. dose (375nm + 405nm) | ||
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