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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 508: Line 508:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|No flat alignment
|rowspan="2" align="center"|25 fields
(two samples)
375nm, high res camera
|'''X'''
|'''X'''
| 0.0±0.05
| 0.0±0.05
Line 522: Line 522:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|With flat alignment
|rowspan="2" align="center"|Scaled first print, 10 points
375nm, high res camera
|'''X'''
| 0.0±0.05
| 0.0±0.05
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| 0.0±0.05
| 0.0±0.05
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|25 fields
405nm, high res camera
|'''X'''
|'''X'''
| 0.0±0.05
| 0.0±0.05
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