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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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[[Image:section under construction.jpg|70px]]
[[Image:section under construction.jpg|70px]]
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!colspan="2" align="center"|
!Shift (median) [µm]
!Misplacement [µm]
!Run-out (gain) [ppm]
!Rotation [ppm]
|-
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|No flat alignment
(two samples)
|'''X'''
| 0.0±0.05
| 0.0±0.05
| 0.0±1.67
| 0.0±1.18
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| 0.0±0.05
| 0.0±0.05
| 0.0±1.67
| 0.0±1.18
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|With flat alignment
|'''X'''
| 0.0±0.05
| 0.0±0.05
| 0.0±1.67
| 0.0±1.18
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| 0.0±0.05
| 0.0±0.05
| 0.0±1.67
| 0.0±1.18
|}


==Top Side Alignment==
==Top Side Alignment==