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Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions

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[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1]]
[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1]]


The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers with aluminium or ALD oxides Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>.
The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium or ALD oxides Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>.


This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom B-1. In this furnace allowed to process wafers that contain aluminium. Please check the cross contamination information in LabManager before you use the furnace.  
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom B-1. In this furnace allowed to process wafers that contain aluminium. Please check the cross contamination information in LabManager before you use the furnace.  
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