Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Aligner: Maskless 02 is configured with the so-called "Write Mode I", which uses a higher demagnification, higher NA lens system to achieve higher resolution. This reduces the depth of focus (technically ''depth of field''), making it more difficult to achieve good lithographic results in thicker resist coatings. The theoretical DOF of Aligner: Maskless 02 is 0.3µm, compared to 1µm for Aligner: Maskless 01. In order to enable processing of thick resists, the Aligner: Maskless 02 has been configured with the High Aspect Ratio Mode, which uses a variable aperture in the optical path to decrease the (illumination) NA of the system, thus increasing the DOF at the expense of intensity and resolution limit. | Aligner: Maskless 02 is configured with the so-called "Write Mode I", which uses a higher demagnification, higher NA lens system to achieve higher resolution. This reduces the depth of focus (technically ''depth of field''), making it more difficult to achieve good lithographic results in thicker resist coatings. The theoretical DOF of Aligner: Maskless 02 is 0.3µm, compared to 1µm for Aligner: Maskless 01. In order to enable processing of thick resists, the Aligner: Maskless 02 has been configured with the High Aspect Ratio Mode, which uses a variable aperture in the optical path to decrease the (illumination) NA of the system, thus increasing the DOF at the expense of intensity and resolution limit. | ||
[[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | [[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | ||
'''Results from acceptance test:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
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|- | |||
|-style="background:silver; color:black" | |||
! | |||
!150µm SU-8 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Standard (800) | |||
6000 mJ/cm2 | |||
|[[Image:5214E DEV HighResolution crop.jpg|350px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Large (100) | |||
16500 | |||
|[[Image:MiR HighResolution crop.jpg|350px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|X-Large (60) | |||
55000 | |||
|[[Image:5214E HighResolution crop.jpg|350px]] | |||
|} | |||
'''Dose factor for different wavelength and aperture settings:''' | '''Dose factor for different wavelength and aperture settings:''' | ||