Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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MLA150_intensityVSaperture.JPG | MLA150_intensityVSaperture.JPG | ||
[[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | [[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | ||
'''Dose factor for different wavelength and aperture settings:''' | |||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:center;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
| | |||
!375nm | |||
!405nm | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ 5214E | |||
|0.95 | |||
|1.3 | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ 4562 | |||
|? | |||
|? | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ MiR 701 | |||
|1 | |||
|1.2 | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ nLOF 2020 | |||
|3 | |||
|NA | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!SU-8 | |||
|10-15 | |||
|NA | |||
|- | |||
|} | |||
*Intensity vs. aperture (405nm + 375nm) | *Intensity vs. aperture (405nm + 375nm) | ||