Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm) | Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm) | ||
==Writing speed== | ==Writing speed== | ||
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<br clear="all" /> | <br clear="all" /> | ||
=Features= | |||
==Substrate centring and flat alignment== | ==Substrate centring and flat alignment== | ||