Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:section under construction.jpg|70px]] | [[Image:section under construction.jpg|70px]] | ||
*5206E 0.5µm 375nm, dev | *5206E 0.5µm 375nm, dev 2xSP30s | ||
Fast: 60mJ/cm<sup>2</sup>; defoc -6 (1µm, not optimized) | Fast: 60mJ/cm<sup>2</sup>; defoc -6 (1µm, not optimized) | ||