Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm) | Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm) | ||
==Exposure dose== | ==Exposure dose== | ||
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At the end of substrate detection, the sample is scanned twice along the bottom edge (flat), in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat/edge of the substrate. | At the end of substrate detection, the sample is scanned twice along the bottom edge (flat), in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat/edge of the substrate. | ||
*Substrate centering + flat alignment test | |||
==Labelling== | ==Labelling== | ||